The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Dec. 09, 2021
Applicant:

Inficon, Inc., East Syracuse, NY (US);

Inventors:

Shawn Briglin, Cazenovia, NY (US);

Michael Vollero, Manlius, NY (US);

John Gordon Wiley, Marietta, NY (US);

Mario Weder, Syracuse, NY (US);

Assignee:

Inficon, Inc., East Syracuse, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01J 37/3255 (2013.01); H01J 37/32715 (2013.01); H01J 37/32816 (2013.01); H01J 37/32954 (2013.01); H01J 2237/327 (2013.01);
Abstract

A plasma generation device for generating a plasma comprises a support having a first side and an opposing second side. The support is comprised of a ceramic matrix and a split-ring conductor is embedded in the ceramic matrix. A hermetically sealed via extends from the split-ring conductor to the second side of the support and connects to an electrical supply. A ground plane is formed on the second side of the support. A plasma is generated proximate to the first side of the support, and the support seals to a wall of the chamber such that the first side is exposed to the one or more gases inside the chamber and the second side is isolated from the plasma and the one or more gases inside of the chamber.


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