Inficon Gmbh

Michael F Vollero

Shawn M Briglin

John Gordon Wiley

Mario Weder

Jochen Wagner

Nigel Sousou

An electron bombardment ion source assembly for use in a mass spectrometer and including an anode extending along an axis and surrounding an ionization volume. At least two filaments are each configured to thermionically emit electrons and are positioned outside the ionization volume and proximate to the anode. The at least two filaments each comprise an elliptically-shaped portion and non-elliptical portions on either end of the elliptically-shaped portion. The non-elliptically-shaped portions are configured to be mounted in a fixed position relative to the anode to maintain a constant distance between the elliptically-shaped portion and the anode. The elliptically-shaped portion extends along a plane that intersects a plane perpendicular to the axis of the anode at a non-zero angle.

Ion source assembly with multiple elliptical filaments

A photoionization sensor assembly includes a housing defining a chamber with a first end and an opposing second end and being permeable to the analyte gas and non-analyte gases. A radiation source is structured to emit photons into the chamber. A first, second and third electrode are positioned in the chamber. The photons ionize the analyte gas, are insufficient to ionize the non-analyte gases, and causing ejection of photoelectrons from the third electrode. A controller is structured to receive a measurement of a total pressure and electrically bias the electrodes to collect the photoelectrons on the first and second electrodes in a ratio dependent on the total pressure. The controller is structured to determine the ratio of photoelectrons that are collected on the first and second electrodes at the total pressure and determine an amount of electrical current due to ionization by correcting the measured current using the determined ratio.

Partial pressure gauge assembly for process contaminant detection using photoionization and associated method

A plasma generation device for generating a plasma comprises a support having a first side and an opposing second side. The support is comprised of a ceramic matrix and a split-ring conductor is embedded in the ceramic matrix. A hermetically sealed via extends from the split-ring conductor to the second side of the support and connects to an electrical supply. A ground plane is formed on the second side of the support. A plasma is generated proximate to the first side of the support, and the support seals to a wall of the chamber such that the first side is exposed to the one or more gases inside the chamber and the second side is isolated from the plasma and the one or more gases inside of the chamber.

HTCC antenna for generation of microplasma

A time-of-flight mass spectrometer assembly includes a flange with a vacuum chamber facing surface and an environment facing surface. The flange defines an opening that extends between the vacuum chamber facing surface and the environment facing surface. A plurality of stacked components are supported by the vacuum chamber facing surface of the flange. A secondary flange is removably secured within the opening of the flange. The secondary flange includes a vacuum chamber facing surface and an environment facing surface. A supported spectrometer component is supported by the vacuum chamber facing surface of the secondary flange such that removal of the secondary flange from the flange acts to remove the supported component from the plurality of stacked components supported by the vacuum chamber facing surface of the flange.

Time-of-flight mass spectrometer assembly with a secondary flange

An ion source assembly for use in a mass spectrometer comprises a first anode defining a first ionization volume and a first electron source positioned proximate the first anode and configured to generate electrons that pass through the first anode and into the first ionization volume. The ions source assembly further includes a second anode defining a second ionization volume and a second electron source positioned proximate to the second anode and configured to generate to generate electrons that pass through the second anode and into the second ionization volume. At least one optical element is positioned proximate the first ionization volume and defines an aperture. The first and second anodes and the first and second ionization volumes are positioned along an ion optical axis of the mass spectrometer, and the first anode is positioned between the second anode and the aperture.

Ion source assembly with multiple ionization volumes for use in a mass spectrometer

Systems for a managing a chemical process and photoionization detectors for analyzing a process gas are presented. In one aspect, the system includes a process gas source in fluid communication with the process chamber and a photoionization detector. The photoionization detector is configured to analyze the process gas. The photoionization detector includes a heat resistant coupling for connection to the system, a gas sample chamber with the radiation window soldered or brazed to a wall of the gas sample chamber, and a radiation source configured to emit radiation through the radiation window and into the gas sample chamber to analyze the process gas. In another aspect, the photoionization detector includes a removable coupling, a gas sample chamber, and a radiation source. The removable coupling is for connection to the process gas handling system and includes a metal gasket and metal flanges.

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Manlius, NY, United States of America

Michael F Vollero