Michael Brugger

Title: Michael Brugger: Innovator in Ion Implantation Technology

Introduction

Michael Brugger is a notable inventor based in Lieserbruecke, Austria. He has made significant contributions to the field of semiconductor technology, particularly in ion implantation methods and apparatus. With a total of 2 patents, Brugger's work has advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Brugger's latest patents include an ion implantation method and an ion implantation apparatus. The ion implantation method involves changing the ion acceleration energy and/or the ion beam current density while moving a semiconductor substrate relative to the ion beam. This innovative approach enhances the precision of ion implantation on semiconductor surfaces. Additionally, his method for implanting ions into a semiconductor substrate includes performing a test implantation to determine an implantation angle offset. This adjustment allows for more accurate target implantations, improving the overall quality of semiconductor devices.

Career Highlights

Michael Brugger is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has positioned him as a key player in the development of advanced ion implantation technologies. Brugger's expertise in this area has contributed to the company's reputation for innovation and excellence in semiconductor manufacturing.

Collaborations

Brugger has collaborated with notable colleagues such as Moriz Jelinek and Hans-Joachim Schulze. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Michael Brugger's contributions to ion implantation technology have made a significant impact on the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in this critical field.