Michael A Many

Title: Michael A Many: Innovator in Semiconductor Technology

Introduction

Michael A Many is a prominent inventor based in Meridian, ID (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods of forming patterns for semiconductor device structures, which are crucial for the advancement of electronic devices.

Latest Patents

Michael A Many's latest patents include innovative methods for forming patterns in semiconductor device structures. These methods involve deprotecting an outer portion of a first photosensitive resist material and forming a second photosensitive resist material. The process includes exposing portions of both resist materials to radiation and subsequently removing the deprotected outer portion along with the exposed areas. Additionally, his patents describe forming a first resist material over a substrate, which consists of a first portion and a relatively thicker second portion. The methods ensure that substantial portions of the resist materials are deprotected and exposed to radiation, allowing for precise pattern formation in semiconductor devices.

Career Highlights

Michael A Many is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work at Micron has allowed him to develop and refine his innovative techniques, contributing to the company's reputation for cutting-edge technology.

Collaborations

Michael collaborates with talented coworkers, including Scott L Light and Yuan He. Their combined expertise fosters a creative environment that drives innovation in semiconductor technology.

Conclusion

Michael A Many is a key figure in the semiconductor industry, with a focus on developing advanced methods for pattern formation in semiconductor devices. His contributions through patents and collaboration with colleagues continue to shape the future of technology.