Michael A Laughery

Title: Michael A Laughery: Innovator in Semiconductor Technology

Introduction

Michael A Laughery is a notable inventor based in Orlando, FL (US), recognized for his contributions to semiconductor technology. With a total of 3 patents, he has made significant advancements in the field, particularly in the engineering of gate dielectrics and interface structures.

Latest Patents

One of his latest patents is focused on N-profile engineering at the poly/gate oxide and gate oxide/SI interfaces through NH3 annealing of a layered poly/amorphous-silicon structure. This method provides a structure that enhances the integrity of gate oxides and reduces the degradation of device performance by suppressing Boron diffusion. Another significant patent involves a method for forming a nitride layer suitable for advanced gate dielectric materials. This innovation allows for the creation of ultra-thin gate dielectrics, less than 10 nm in thickness, which can be formed in a single furnace cluster, thus improving the efficiency of integrated circuit environments.

Career Highlights

Throughout his career, Michael has worked with prominent companies such as Lucent Technologies Inc. and Agere Systems. His work has been instrumental in pushing the boundaries of semiconductor technology, particularly in the development of materials that enhance device performance.

Collaborations

Michael has collaborated with talented individuals in the field, including Yi Ma and Pradip Kumar Roy. These partnerships have contributed to the innovative solutions he has developed over the years.

Conclusion

Michael A Laughery's work in semiconductor technology exemplifies the impact of innovation on modern electronics. His patents and career achievements highlight his role as a key contributor to advancements in the industry.