Company Filing History:
Years Active: 2023-2025
Title: The Innovative Contributions of Mengmeng Wang
Introduction
Mengmeng Wang is a prominent inventor based in Hefei, China. She has made significant contributions to the field of semiconductor technology. With a total of 5 patents to her name, her work has been instrumental in advancing semiconductor manufacturing processes.
Latest Patents
Mengmeng Wang's latest patents include a method for manufacturing a semiconductor structure. This method involves providing a substrate with a bottom protecting wall formed within it. A mask layer is then applied to the substrate, followed by the formation of a groove in the mask layer. Notably, a non-zero angle exists between the sidewall of the groove and the sidewall of the bottom protecting wall, with the groove extending into the substrate. Finally, a top protecting wall is formed in the groove, which is in direct contact with the bottom protecting wall. Another significant patent details a semiconductor structure that includes a chip structure and a sealing structure on a substrate. This sealing structure comprises a metal wall body and a blocking wall body positioned atop the metal wall body, both surrounding the chip structure.
Career Highlights
Mengmeng Wang is currently employed at Changxin Memory Technologies, Inc. Her role at the company allows her to apply her innovative ideas and technical expertise in semiconductor manufacturing. Her contributions have been vital in enhancing the efficiency and effectiveness of semiconductor structures.
Collaborations
Mengmeng has collaborated with notable colleagues, including Hsin-Pin Huang and Qiang Zhang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Mengmeng Wang's work in semiconductor technology exemplifies her dedication to innovation and excellence. Her patents and contributions continue to shape the future of the industry.