Tainan, Taiwan

Meng-Hwang Liu

This inventor holds 4 USPTO granted patents. Top assignee: Macronix International Co., Ltd.. Active years: 2000-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Meng-Hwang Liu. Retrieved from https://idiyas.com/inventor/meng-hwang-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Taiwan, TW (2000 - 2001)
  • Tainan, TW (2000 - 2002)

Company Filing History:


Years Active: 2000-2002

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Meng-Hwang Liu: Innovator in Semiconductor Technology

Introduction

Meng-Hwang Liu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the reliability and efficiency of electronic devices through innovative protection mechanisms.

Latest Patents

One of his latest patents is titled "Electrostatic discharge input protection for reducing input resistance." This patent presents an ESD protection structure designed to safeguard internal circuits. It comprises a primary protection device, a secondary protection device, and a substrate pickup. The design allows both protection devices to share a common source, which effectively lowers the trigger voltage of the primary protection device to match that of the secondary protection device. This innovation eliminates the need for an isolation resistor between the two devices.

Another notable patent is "Silicide blocking process to form non-silicided regions on MOS devices." This invention involves a semiconductor device built on a substrate that includes an ESD region and an internal region. A protective layer is applied over part of the ESD region to prevent silicide formation, while silicide is created on the unprotected portions of both the internal and ESD regions. The process includes removing part of the protective layer to create sidewall spacers adjacent to a gate electrode in the ESD region.

Career Highlights

Meng-Hwang Liu is currently employed at Macronix International Co., Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative approach have positioned him as a key player in advancing electronic device protection.

Collaborations

Throughout his career, Meng-Hwang Liu has collaborated with notable colleagues, including Tao-Cheng Lu and Mam-Tsung Wang. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and innovation.

Conclusion

Meng-Hwang Liu's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work not only enhances device reliability but also paves the way for future innovations in electronic protection mechanisms.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…