Location History:
- Sunnyvale, CA (US) (2000)
- Portland, OR (US) (2004 - 2009)
Company Filing History:
4 out of 54,750 
1 out of 832,843 Years Active: 2000-2009
Title: Melissa K Shell: Innovator in EUV Lithography Technology
Introduction
Melissa K Shell is a prominent inventor based in Sunnyvale, CA. She has made significant contributions to the field of Extreme Ultraviolet (EUV) lithography, holding a total of 5 patents. Her work focuses on techniques that enhance the performance and reliability of EUV sources, particularly in preventing contamination.
Latest Patents
One of her latest patents is titled "Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system." This invention addresses the issue of tin contamination, which can lead to a loss of reflectivity in EUV sources that utilize tin vapor as a plasma fuel. The patent describes the use of passivation coatings that prevent tin adhesion on reflective surfaces and gettering agents that react with tin to mitigate contamination. Another notable patent is "Protective coatings for radiation source components," which involves the application of erosion-resistive coatings made from diamond and diamond-like materials on critical plasma-facing surfaces of an electrical gas plasma head for EUV sources. These coatings are designed to enhance durability and performance in demanding environments.
Career Highlights
Melissa has worked with notable companies, including Intel Corporation, where she has applied her expertise in semiconductor technology and lithography. Her innovative approaches have contributed to advancements in the field, making her a respected figure among her peers.
Collaborations
Throughout her career, Melissa has collaborated with esteemed colleagues such as Robert L Bristol and Bryan J Rice. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Melissa K Shell's contributions to EUV lithography technology exemplify her dedication to innovation and excellence. Her patents reflect her commitment to solving complex challenges in the field, making her a valuable asset to the industry.