This inventor holds 2 USPTO granted patents. Top assignee: Basf Se Corporation. Active years: 2014-2016.
Location History:
- Taoyuan, TW (2014)
- Yangmei, TW (2016)
Company Filing History:
Years Active: 2014-2016
Title: Innovations by MeiChin Shen
Introduction
MeiChin Shen is a notable inventor based in Yangmei, Taiwan. He has made significant contributions to the field of semiconductor applications, holding a total of 2 patents. His work focuses on developing advanced materials and processes that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
One of MeiChin Shen's latest patents is titled "Post ion implant stripper for advanced semiconductor application." This invention relates to a substantially water-free photoresist stripping composition that is useful in removing photoresist after the ion-implant process. The composition includes an amine, an organic solvent, and a co-solvent, ensuring that it remains substantially water-free (less than 3 wt % HO). Additionally, he has developed an "Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates." This patent describes a method for texturizing silicon substrates using an aqueous acidic etching solution, which includes hydrofluoric acid, nitric acid, and at least one anionic polyether.
Career Highlights
MeiChin Shen is currently employed at BASF SE Corporation, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing technologies that are critical for modern electronics.
Collaborations
Some of his notable coworkers include Andreas Klipp and Simon Braun, who collaborate with him on various projects within the semiconductor industry.
Conclusion
MeiChin Shen's contributions to semiconductor technology through his patents and work at BASF SE Corporation highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of semiconductor applications.