The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Jul. 26, 2010
Chienshin Chen, Taichung, TW;
Meichin Shen, Yangmei, TW;
Chiahao Chan, Jhubei, TW;
Andreas Klipp, Lambsheim, DE;
ChienShin Chen, Taichung, TW;
MeiChin Shen, Yangmei, TW;
ChiaHao Chan, Jhubei, TW;
Andreas Klipp, Lambsheim, DE;
BASF SE, Ludwigshafen, DE;
Abstract
The present invention relates to a substantially water-free photoresist stripping composition. Particularly, the present invention relates to a substantially water-free photoresist stripping composition useful in removing the photoresist after ion-implant process, comprising: (a) an amine, (b) an organic solvent A, and (c) a co-solvent, wherein the composition is substantially water-free (<3 wt % HO). The present invention also provides a process for post-ion implantation stripping by using the composition of the present invention.