The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Aug. 25, 2011
Simon Braun, Mannheim, DE;
Andreas Klipp, Lambsheim, DE;
Cornelia Roeger-goepfert, Schwetzingen, DE;
Christian Bittner, Bensheim, DE;
Meichin Shen, Taoyuan, TW;
Chengwei Lin, Tapei County, TW;
Simon Braun, Mannheim, DE;
Andreas Klipp, Lambsheim, DE;
Cornelia Roeger-Goepfert, Schwetzingen, DE;
Christian Bittner, Bensheim, DE;
MeiChin Shen, Taoyuan, TW;
Chengwei Lin, Tapei County, TW;
BASF SE, Ludwigshafen, DE;
Abstract
An aqueous acidic solution and an aqueous acidic etching solution suitable for texturizing the surface of single crystal and polycrystal silicon substrates, hydrofluoric acid; nitric acid; and at least one anionic polyether, which is surface active; a method for texturizing the surface of single crystal and polycrystal silicon substrates comprising the step of (1) contacting at least one major surface of a substrate with the said aqueous acidic etching solution; (2) etching the at least one major surface of the substrate for a time and at a temperature sufficient to obtain a surface texturization consisting of recesses and protrusions; and (3) removing the at least one major surface of the substrate from the contact with the aqueous acidic etching solution; and a method for manufacturing photovoltaic cells and solar cells using the said solution and the said texturizing method.