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For the Inventor, By the Inventor

San Francisco, CA, United States of America

Mehmet Derya Tetiker

This inventor holds 16 USPTO granted patents and 3 published patent applications and 2 EPO patents, primarily in Etch Process Optimization. Top assignees: Lam Research Corporation, Corning Incorporated. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mehmet Derya Tetiker. Retrieved from https://idiyas.com/inventor/mehmet-derya-tetiker

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 87.5

 

Average Co-Inventor Count = 4.6

ph-index = 7

Forward Citations = 127(Granted Patents)


Location History:

  • Painted Post, NY (US) (2016)
  • San Francisco, CA (US) (2016 - 2021)
  • Santa Clara, CA (US) (2023)

Company Filing History:

goldMedal13 out of 3,955 
 
Lam Research Corporation
 patents
silverMedal3 out of 7,491 
 
Corning Incorporated
 patents

Years Active: 2016-2026

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Areas of Expertise:
Etch Model Calibration
Antimicrobial Glass
Substrate Samples
Optical Scatterometry
Edge Placement Error
Surface Kinetic Model
Reflectance Spectra
Process Point Detection
Endpoint Detection
Sludge Control
Ion Exchange Systems
Proximity Correction
16 patents (USPTO):Explore Patents
1. 12581917 - Matching pre-processing and post-processing substrate samples (2026-03-17),
2. 11704463 - Method of etch model calibration using optical scatterometry (2023-07-18),
3. 10997345 - Method of etch model calibration using optical scatterometry (2021-05-04),
4. 10683234 - Methods of making antimicrobial glass articles (2020-06-16),
5. 10572697 - Method of etch model calibration using optical scatterometry (2020-02-25),
6. 10534257 - Layout pattern proximity correction through edge placement error prediction (2020-01-14),
7. 10386828 - Methods and apparatuses for etch profile matching by surface kinetic model optimization (2019-08-20),
8. 10303830 - Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization (2019-05-28),
9. 10254641 - Layout pattern proximity correction through fast edge placement error prediction (2019-04-09),
10. 10242849 - System and method for detecting a process point in multi-mode pulse processes (2019-03-26),
11. 10032681 - Etch metric sensitivity for endpoint detection (2018-07-24),
12. 9996647 - Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization (2018-06-12),
13. 9792393 - Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization (2017-10-17),
14. 9640371 - System and method for detecting a process point in multi-mode pulse processes (2017-05-02),
15. 9359250 - Substrate ion exchange systems with single- and multi-component ion exchange baths and methods for maintaining such systems (2016-06-07),

Title: Innovations of Mehmet Derya Tetiker

Introduction

Mehmet Derya Tetiker is a prominent inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor device fabrication, holding a total of 15 patents. His work focuses on optimizing process simulation models, which are crucial for the advancement of semiconductor technology.

Latest Patents

One of his latest patents is a method of etch model calibration using optical scatterometry. This computer-implemented method optimizes a process simulation model that predicts the results of semiconductor device fabrication operations. The method involves generating cost values based on computationally predicted results and metrology results obtained from performing the fabrication operation in a reaction chamber. The optimization process utilizes pre-process profiles and aims to enhance post-process profiles against profile metrology results. Cost values from techniques such as optical scatterometry, scanning electron microscopy, and transmission electron microscopy guide this optimization.

Career Highlights

Throughout his career, Mehmet Derya Tetiker has worked with notable companies, including Lam Research Corporation and Corning Incorporated. His experience in these organizations has allowed him to develop and refine his innovative approaches to semiconductor fabrication.

Collaborations

Some of his notable coworkers include Andrew D Bailey, III and Saravanapriyan Sriraman. Their collaboration has contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Mehmet Derya Tetiker's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor device fabrication.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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