Tokyo, Japan

Megumi Arakawa

This inventor holds 2 USPTO granted patents. Top assignee: Jsr Corporation. Active years: 2018-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Megumi Arakawa. Retrieved from https://idiyas.com/inventor/megumi-arakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Megumi Arakawa: Innovator in Chemical Mechanical Polishing

Introduction

Megumi Arakawa is a prominent inventor based in Minato-ku, Japan. She has made significant contributions to the field of chemical mechanical polishing, with a focus on developing innovative treatment and cleaning compositions. Her work has led to the filing of 2 patents that address critical challenges in the industry.

Latest Patents

Arakawa's latest patents include a treatment composition for chemical mechanical polishing and a cleaning composition and method. The treatment composition is designed for treating objects that include a wiring layer containing metal. It comprises a nitrogen-containing compound, a surfactant or polyacrylic acid, and a pH adjusting agent. The composition ensures optimal performance by maintaining a specific relationship between electrode charge transfer resistance values. The cleaning composition features a variety of compounds, including fatty acids and phosphonic acids, and is formulated to have a pH of 9 or more, enhancing its effectiveness in cleaning applications.

Career Highlights

Megumi Arakawa is currently employed at JSR Corporation, where she continues to innovate and develop new solutions in her field. Her expertise in chemical mechanical polishing has positioned her as a key player in advancing technologies that improve manufacturing processes.

Collaborations

Throughout her career, Arakawa has collaborated with notable colleagues, including Kiyotaka Mitsumoto and Tatsuya Yamanaka. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Megumi Arakawa's contributions to the field of chemical mechanical polishing exemplify her dedication to innovation and excellence. Her patents reflect her commitment to advancing technology and improving processes within the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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