This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Commissariat a L'energie Atomique Et Aux Energies Alternatives, Université Grenoble Alpes, Centre National De La Recherche Scientifique. Active years: 2025-2026.
Company Filing History:
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Years Active: 2025-2026
Title: Maxime Legallais: Innovator in Aluminum Nitride Technology
Introduction
Maxime Legallais is a notable inventor based in Grenoble, France. He has made significant contributions to the field of materials science, particularly in the production of aluminum nitride (AlN) layers. His innovative methods have implications for various applications in semiconductor technology.
Latest Patents
Maxime Legallais holds a patent for a method of producing a layer of aluminum nitride on a structure of silicon or III-V materials. This method involves several deposition cycles performed in a plasma reactor. Each cycle includes the deposition of aluminum-based species and nitridation of the exposed surface, utilizing nitrogen-based precursors to form a nitrogen-based plasma. The application of a non-zero polarization voltage during this process enhances the quality of the AlN layer.
Career Highlights
Throughout his career, Maxime Legallais has worked with prominent organizations such as the Commissariat à l'Énergie Atomique et aux Énergies Alternatives and the Centre National de la Recherche Scientifique (CNRS). His work in these institutions has allowed him to advance his research and contribute to the scientific community.
Collaborations
Maxime has collaborated with esteemed colleagues, including Bassem Salem and Thierry Baron. These partnerships have fostered a collaborative environment that enhances innovation and research outcomes.
Conclusion
Maxime Legallais is a distinguished inventor whose work in aluminum nitride technology showcases his expertise and dedication to advancing materials science. His contributions continue to influence the field and inspire future innovations.