Max Wiki

Title: Max Wiki: Innovator in Photolithography and Optical Substrates

Introduction

Max Wiki is a prominent inventor based in Zurich, Switzerland. He has made significant contributions to the fields of photolithography and optical substrates, holding a total of five patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.

Latest Patents

Max Wiki's latest patents include a method for producing masks for photolithography and an optical substrate for enhanced detectability of fluorescence. The first patent describes a mask that comprises opaque and transparent areas, designed to improve the exposure process in photolithography. This mask features deep-etched areas that enhance the structural depth, ensuring effective contact with the substrate. The second patent focuses on a sample substrate that utilizes a multilayer interference coating to optimize fluorescence detection. This design ensures that fluorescent materials are positioned near an antinode of a standing wave, enhancing their visibility under excitation light.

Career Highlights

Throughout his career, Max Wiki has worked with notable companies such as Oerlikon Balzers AG and Unaxis-Balzers Aktiengesellschaft. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in his field.

Collaborations

Max has collaborated with talented individuals, including Johannes Edlinger and Heidi Thome-Forster. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Max Wiki's contributions to photolithography and optical substrates demonstrate his commitment to innovation and excellence in technology. His patents reflect a deep understanding of the complexities involved in these fields, positioning him as a key figure in advancing modern scientific applications.