Oc Oerlikon Balzers Ag

Unaxis-balzers Aktiengesellschaft

Oerlikon Trading Ag, Trubbach

Max Wiki

Johannes Edlinger

Claus Heine-Kempkens

Martin Kaspar

Bernd Maisenhoelder

Heidi Thome-Forster

Michael Lanker

Jörg Kraus

Bernd Maisenholder

A mask for photolithography methods comprises opaque and transparent areas as well as a surface structure. For the contact with a substrate () to be exposed at least a few opaque areas are incorporated and at least a few transparent areas are arranged in a spaced fashion and are deep-etched down to a structural depth. In a further embodiment at least one transparent area is designed as a positively resting area (). The structural depth in the deep-etched areas is greater than the thickness of the surface structure, at least greater than or equal to 1 &#x3bc;m.

Method for producing masks for photolithography and the use of such masks

A sample substrate adapted for use with fluorescence excitation light with a first wavelength. A reflector is disposed on a base. The reflector includes a reflecting multilayer interference coating with at least two layers. Not all of the layers L fulfill a quarterwave condition: dL&#xb7;nL=(2N+1)&#xb7;&#xbc; wherein dL is a physical thickness of layer L, nL is an index of refraction of layer L at the first wavelength, N is an integer equal to or greater than zero and 1 is the first wavelength. Thicknesses of the layers ensure that any fluorescent sample material disposed on top of said multilayer interference coating would be located near an antinode of a standing wave formed by the excitation light with the first wavelength incident on said substrate.

Optical substrate for enhanced detectability of fluorescence

A sample substrate adapted for use with electromagnetic excitation light includes a base and a layer system. The layer system includes a multilayer interference coating with at least two layers wherein the thicknesses of the layers ensure that light emitted by a fluorescent sample material disposed on top of said multilayer interference coating is reflected. Light directed to a fluorescent sample material disposed on the substrate causes light to be emitted from the sample. The layer system includes a multilayer interference coating with at least two layers wherein thicknesses of the layers cause separation of the excitation light from the emitted light.

Optical device for surface-generated fluorescence

A sample substrate adapted for use with fluorescence excitation light with a first wavelength. A reflector is disposed on a base. The reflector includes a reflecting multilayer interference coating with at least two layers. Not all of the layers L fulfill a quarterwave condition: dL&#xb7;nL=(2N+1)&#xb7;1/4 wherein dL is a physical thickness of layer L, nL is an index of refraction of layer L at the first wavelength, N is an integer equal to or greater than zero and 1 is the first wavelength. Thicknesses of the layers ensure that any fluorescent sample material disposed on top of said multilayer interference coating would be located near an antinode of a standing wave formed by the excitation light with the first wavelength incident on said substrate.

A light coupling element is proposed with a surface () of a material which is transparent to light of a given wavelength (&#x3bb;). In order for the light coupling element to act independently of the direction of the vectorial parameters of the light, such as in particular of the polarization, on the surface of the light coupling element line-form indentations or elevations () are provided which are equidistantly parallel and which intersect at given angles (&#x3c6;).

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