The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2009
Filed:
Feb. 22, 2005
Applicants:
Max Wiki, Ecublens, CH;
Michael Lanker, Pfaffikon, CH;
Inventors:
Max Wiki, Ecublens, CH;
Michael Lanker, Pfaffikon, CH;
Assignee:
Oerlikon Trading AG, Trubbach, Trubbach, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mask for photolithography methods comprises opaque and transparent areas as well as a surface structure. For the contact with a substrate () to be exposed at least a few opaque areas are incorporated and at least a few transparent areas are arranged in a spaced fashion and are deep-etched down to a structural depth. In a further embodiment at least one transparent area is designed as a positively resting area (). The structural depth in the deep-etched areas is greater than the thickness of the surface structure, at least greater than or equal to 1 μm.