Company Filing History:
Years Active: 2002
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Title: Unveiling the Innovation by Max Biberger: Pioneering PVD Deposition Technology
Introduction: Max Biberger, a distinguished inventor based in Palo Alto, CA, has made significant contributions to the field of semiconductor manufacturing with his groundbreaking patent on PVD deposition of titanium and titanium nitride layers.
Latest Patents: Max Biberger holds a patent for a revolutionary method that enables the deposition of Ti and TiN layers on an integrated circuit substrate without the need for a collimator or a shutter. This innovative technique utilizes a titanium target in non-nitrided mode within a hollow cathode magnetron apparatus, allowing for the deposition of layers in vias and trenches with aspect ratios up to 5:1.
Career Highlights: Max Biberger is associated with Novellus Systems Incorporated, a prominent technology company known for its advancements in semiconductor manufacturing. His role at Novellus Systems has been instrumental in driving innovation and pushing the boundaries of existing technologies.
Collaborations: Throughout his career, Max Biberger has collaborated closely with renowned industry experts such as Gerard Chris D'Couto and George Tkach. These collaborations have led to the development of cutting-edge technologies that have revolutionized the semiconductor manufacturing industry.
Conclusion: In conclusion, Max Biberger's pioneering work in the field of semiconductor manufacturing has not only advanced the industry but also cemented his position as a visionary inventor. His dedication to innovation and collaboration continues to inspire future generations of inventors and researchers in the pursuit of technological excellence.