This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 2 EPO patents. Top assignee: Sun Chemical Corporation. Active years: 2020.
Company Filing History:
Years Active: 2020
Title: Matthias Helliblau: Innovator in Lithographic Ink Technology
Introduction
Matthias Helliblau is a notable inventor based in Seligenstadt, Germany. He has made significant contributions to the field of lithographic printing through his innovative patent. His work focuses on enhancing the performance of ink compositions used in web-offset lithographic printing.
Latest Patents
Helliblau holds a patent for "Additives to litho inks to eliminate ink feedback." This patent describes web-offset lithographic ink compositions that incorporate an alkyl thioether surfactant, an alkoxylated modified rosin, or a combination of these components. The ink compositions can be either oil-based or water-based and may also be radiation-curable. The resulting formulations are designed to substantially reduce or eliminate ink feedback and build-up during the printing process.
Career Highlights
Matthias Helliblau is associated with Sun Chemical Corporation, a leading company in the field of printing inks and coatings. His work at Sun Chemical has allowed him to develop innovative solutions that address common challenges in lithographic printing.
Collaborations
Throughout his career, Helliblau has collaborated with talented professionals, including Ramasamy Krishnan and Jeff Jones. These collaborations have contributed to the advancement of ink technology and improved printing processes.
Conclusion
Matthias Helliblau's contributions to lithographic ink technology demonstrate his commitment to innovation in the printing industry. His patent for additives to litho inks showcases his ability to solve complex problems and enhance printing efficiency.