The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2020

Filed:

Sep. 20, 2012
Applicant:

Sun Chemical Corporation, Parsippany, NJ (US);

Inventors:

Ramasamy Krishnan, North Brunswick, NJ (US);

Jeff Jones, Chicago, IL (US);

Matthias Helliblau, Seligenstadt, DE;

Assignee:

SUN CHEMICAL CORPORATION, Parsippany, NJ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B41M 1/06 (2006.01); C09D 11/08 (2006.01); C09D 11/101 (2014.01); C09D 11/06 (2006.01); C09D 11/03 (2014.01);
U.S. Cl.
CPC ...
B41M 1/06 (2013.01); C09D 11/03 (2013.01); C09D 11/06 (2013.01); C09D 11/08 (2013.01); C09D 11/101 (2013.01);
Abstract

Provided are web-offset lithographic ink compositions that contain an alkyl thioether surfactant, an alkoxylated modified rosin, or a combination thereof. The ink compositions can be oil-based inks or water-based inks that can be radiation-curable. The resulting ink compositions can be used in web-offset lithographic printing to substantially reduce or eliminate the ink feedback and ink build-up that occurs during printing. Also provided are methods for reducing or eliminating ink feedback and build-up during lithographic printing processes.


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