Sun Chemical Corporation

Matthias Helliblau

Jeff Jones

Ramasamy Krishnan

Provided are web-offset lithographic ink compositions that contain an alkyl thioether surfactant, an alkoxylated modified rosin, or a combination thereof. The ink compositions can be oil-based inks or water-based inks that can be radiation-curable. The resulting ink compositions can be used in web-offset lithographic printing to substantially reduce or eliminate the ink feedback and ink build-up that occurs during printing. Also provided are methods for reducing or eliminating ink feedback and build-up during lithographic printing processes.

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Seligenstadt, Germany

Matthias Helliblau