Location History:
- Garching, DE (2016)
- Munich, DE (2018)
Company Filing History:
Years Active: 2016-2018
Title: Matthias Conradi: Innovator in Wafer Illumination Technology
Introduction
Matthias Conradi is a notable inventor based in Munich, Germany. He has made significant contributions to the field of wafer illumination technology, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
Conradi's latest patents include a spacer displacement device for a wafer illumination unit and a method and device for active wedge error compensation between two objects that can be positioned substantially parallel to each other. The spacer displacement device comprises an actuator, a spacer that can be displaced between an active and an inactive position by the actuator, and a force transmission element made of wire. This invention enhances the functionality of wafer illumination units, making them more efficient. The second patent focuses on expanding the travel or control displacement of linear actuators during imprinting or embossing strokes. It features a wedge error compensating head that includes a movable part, a stationary part, and at least three linear actuators. This design allows for both coarse and fine compensation of wedge errors, ensuring precision during the imprinting process.
Career Highlights
Matthias Conradi works at Suss Microtec Lithography GmbH, a company known for its advanced lithography solutions. His role at the company has allowed him to develop and refine his innovative ideas, contributing to the advancement of wafer illumination technology.
Collaborations
Conradi collaborates with talented individuals such as Sven Hansen and Georg Fink, who share his passion for innovation and technology. Their teamwork fosters a creative environment that leads to groundbreaking advancements in their field.
Conclusion
Matthias Conradi's contributions to wafer illumination technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in lithography and related technologies.