Company Filing History:
Years Active: 2006-2012
Title: Innovations of Matthew Wayne Oonk
Introduction
Matthew Wayne Oonk is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on enhancing the efficiency and effectiveness of semiconductor devices.
Latest Patents
One of Oonk's latest patents is titled "Via contact structure having dual silicide layers." This invention provides a via contact to a diffusion region at the top surface of a substrate, which includes a single-crystal semiconductor region. The via contact consists of a first layer made of a silicide of a first metal in contact with the diffusion region. A dielectric region overlays this first layer, featuring an opening that extends to the top surface of the substrate. A second layer lines the opening and contacts the substrate's top surface, incorporating a second metal and a silicide of the second metal. Additionally, a diffusion barrier layer is present, and a third layer containing a third metal fills the opening.
Another significant patent involves a method where silicide is protected during the MC RIE etch process. This is achieved by first forming an oxide film over the silicide, followed by the etching of the oxide film after the MC RIE etch. The oxide film is created from a film of alloyed metal-silicon on the silicide layer, which is then wet etched. An ozone plasma treatment can be utilized to densify the oxide film, which may be etched using oxide RIE or wet etch techniques.
Career Highlights
Matthew Wayne Oonk is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the semiconductor field. His work has contributed to advancements in technology that are crucial for modern electronic devices.
Collaborations
Oonk has collaborated with several talented individuals, including Kevin E Mello and Jeffrey B Danielson. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Matthew Wayne Oonk is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His contributions continue to shape the future of electronic devices.