Matthew W Last

Title: The Innovations of Matthew W Last

Introduction

Matthew W Last is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of electroplating, particularly in the development of stress relief techniques for electroplated films. His innovative approach has the potential to enhance the performance and durability of various applications.

Latest Patents

Matthew W Last holds a patent for "Stress relief for electroplated films." This invention involves depositing an electroplated film over a substrate with a plating frame pattern that includes a plating field defined by a plurality of individual features. By dividing the plating field into individual features, the delamination force at any location on the plating field is greatly reduced. This allows for the plating of films with large stress, such as high moment films, to a greater thickness than is possible with conventionally plated films. He has 1 patent to his name.

Career Highlights

Matthew is currently employed at Hitachi Global Storage Technologies Netherlands B.V., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of electroplated films, making them more effective for various industrial applications.

Collaborations

Matthew has collaborated with notable colleagues, including Christian Rene Bonhote and Heather K DeSimone. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Matthew W Last is a prominent figure in the field of electroplating, with a focus on stress relief techniques for films. His contributions have the potential to revolutionize the industry and improve the performance of electroplated materials.