Matthew Ocana

Title: Matthew Ocana: Semiconductor Invention and Patent

Introduction

Matthew Ocana is an inventor associated with Albany, New York, and Tokyo Electron Limited. His patent work includes a semiconductor manufacturing method focused on forming conductive features of different widths in separate regions of a semiconductor substrate.

Latest Patents

Ocana is credited with 1 patent: “Semiconductor Devices and Methods of Manufacturing the Same.” The disclosed method provides a semiconductor substrate with first and second regions, forms a stack of dielectric layers over the substrate, and patterns the stack to create trenches in both regions. It then forms conductive features in those trenches, with the features in the second region narrower than those in the first region.

Career Highlights

The available information connects Ocana’s invention to Tokyo Electron Limited, a company involved in semiconductor manufacturing equipment and technologies. His patent describes a process for producing semiconductor structures with region-specific conductive feature widths.

Collaborations

Minjoon Park and Alec Dorfner are identified as Ocana’s coworkers. The provided information does not specify their roles in the patent or the invention.

Conclusion

Matthew Ocana’s patent documents a semiconductor manufacturing approach that creates conductive features of different widths across substrate regions, reflecting his connection to innovation at Tokyo Electron Limited.