Austin, TX, United States of America

Matthew D Castle

This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2011.


% Patents Active = 100.0

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 42(Granted Patents)


Location History:

  • Austin, TX (US) (2000)
  • Morgan Hill, CA (US) (2010 - 2011)

Company Filing History:


Years Active: 2000-2011

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3 patents (USPTO):Explore Patents

Title: The Innovations of Matthew D Castle

Introduction

Matthew D Castle is a notable inventor based in Austin, TX. He has made significant contributions to the field of ion implantation technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of ion beam systems used in semiconductor manufacturing.

Latest Patents

One of his latest patents is for an Ion Beam Guide Tube. This innovative guide tube is designed for use in an ion implanter, positioned adjacent to a semiconductor wafer being implanted. The tube features an outwardly tapering central bore, which alleviates issues related to beam strike as the ion beam passes through. Another significant patent is for Ion Implanters, which includes components that experience the incidence of the ion beam. This design incorporates a chamber with an elongate slot opening defined by edges, allowing a central portion of the ion beam to enter while mitigating the problem of sputtered material escaping back out and becoming entrained in the ion beam.

Career Highlights

Matthew D Castle is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop and refine technologies that are crucial for modern semiconductor fabrication processes.

Collaborations

Some of his notable coworkers include Gregory Robert Alcott and Martin A Hilkene. Their collaboration has contributed to advancements in the field of ion implantation and semiconductor technology.

Conclusion

Matthew D Castle's innovative patents and contributions to ion implantation technology highlight his importance in the semiconductor industry. His work continues to influence the efficiency of semiconductor manufacturing processes.

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