Norwalk, CT, United States of America

Matthew Boudreau

This inventor holds 1 USPTO granted patent. Top assignee: Asml Holding N.v.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Matthew Boudreau. Retrieved from https://idiyas.com/inventor/matthew-boudreau-hiken1gq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Matthew Boudreau: Innovator in Lithographic Device Technology

Introduction

Matthew Boudreau is an accomplished inventor based in Norwalk, CT (US). He has made significant contributions to the field of lithographic devices, showcasing his innovative spirit through his patented technologies.

Latest Patents

Boudreau holds a patent for "Pod handling systems and methods for a lithographic device." This patent involves systems, apparatuses, and methods designed for transporting a reticle chamber, or pod, for processing. The system includes a moving apparatus, a base coupled to the moving apparatus, and a gripping ring that extends from the base. The gripping ring is designed to grip a flange extending from the pod, allowing the moving apparatus to transport the pod effectively. He has 1 patent to his name.

Career Highlights

Matthew Boudreau is currently employed at ASML Holding N.V., a leading company in the semiconductor industry. His work focuses on enhancing the efficiency and effectiveness of lithographic devices, which are crucial for the production of integrated circuits.

Collaborations

Boudreau has collaborated with notable colleagues, including Boris Kogan and Robert Jeffrey Wade, contributing to advancements in their shared field of expertise.

Conclusion

Matthew Boudreau's innovative work in lithographic device technology exemplifies his commitment to advancing the industry. His contributions, particularly through his patent, highlight the importance of innovation in technology development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…