This inventor holds 1 USPTO granted patent. Top assignees: Digital Equipment Corporation, Intel Corporation, National Semiconductor Corporation. Active years: 1997.
Company Filing History:
1 out of 2,297 
1 out of 56,222 
1 out of 4,791 
Years Active: 1997
Title: Matt Stell - Innovator in Chemical-Mechanical Polishing
Introduction
Matt Stell is an accomplished inventor based in Folsom, CA (US). He holds a patent that significantly enhances the process of chemical-mechanical polishing (CMP) for metallic materials. His innovative approach utilizes additives with silica-based slurries to improve metal selectivity during the polishing process.
Latest Patents
Matt Stell's patent, titled "Method of using additives with silica-based slurries to enhance metal selectivity in polishing metallic materials utilizing a chemical-mechanical polishing (CMP) process," focuses on the use of additives to passivate dielectric surfaces. This method reduces the dielectric removal rate when CMP is applied, ensuring that the metallic surface remains largely unaffected. The additive comprises both polar and apolar components, which interact with the surface silanol group of silicon dioxide (SiO.sub.2) to inhibit unwanted interactions with hydroxyl molecules. This innovative technique effectively reduces erosion of the SiO.sub.2 surface while enhancing the selectivity of metal removal over oxide removal.
Career Highlights
Throughout his career, Matt Stell has worked with notable companies such as Sematech, Inc. and Intel Corporation. His experience in these leading organizations has contributed to his expertise in the field of semiconductor manufacturing and polishing processes.
Collaborations
Matt has collaborated with talented individuals in the industry, including Janos Farkas and Rahul Jairath. Their combined efforts have further advanced the development of innovative solutions in the field of chemical-mechanical polishing.
Conclusion
Matt Stell is a prominent inventor whose contributions to the field of chemical-mechanical polishing have made a significant impact. His patented method enhances the efficiency and effectiveness of polishing processes, showcasing his dedication to innovation in the semiconductor industry.