Mats Ekberg

Title: Innovations by Mats Ekberg

Introduction

Mats Ekberg is a notable inventor based in Täby, Sweden. He has made significant contributions to the field of three-dimensional topographic structures through his innovative patents. With a total of four patents to his name, Ekberg's work focuses on advanced methods of exposure in photosensitive materials.

Latest Patents

Mats Ekberg's latest patents include a "Method of iterative compensation for non-linear effects in three-dimensional exposure of resist." This patent addresses the creation of three-dimensional topographic structures using graduated exposure in materials such as photoresist and photosensitive polyimide. The patterns developed can serve various applications, including optical, mechanical, and fluidic components. His second recent patent, "Method of compensation for bleaching of resist during three-dimensional exposure of resist," similarly focuses on the same field and aims to enhance the precision of three-dimensional structures.

Career Highlights

Throughout his career, Mats Ekberg has worked with prominent companies such as Micronic Laser Systems AB and Micronic Mydata AB. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the field of photolithography.

Collaborations

Mats has collaborated with notable individuals in his field, including Torbjörn Sandström and Mikael Wahlsten. These partnerships have further enriched his work and led to advancements in the technologies he has developed.

Conclusion

Mats Ekberg's contributions to the field of three-dimensional topographic structures through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence various applications in optics and materials science.