Yamanashi, Japan

Masayuki Tanaka

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Tokyo Electron Limited, Horiba Stec, Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Tanaka. Retrieved from https://idiyas.com/inventor/masayuki-tanaka-5jm5vmsh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 1


Location History:

  • Nirasaki, JP (2023)
  • Yamanashi, JP (2023)

Company Filing History:


Years Active: 2023

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2 patents (USPTO):Explore Patents

Title: Innovator Masayuki Tanaka: Pioneering Absorbance Analysis Technologies

Introduction

Masayuki Tanaka, based in Yamanashi, Japan, is a notable inventor recognized for his contributions to the field of gas analysis and film formation technology. With a total of two patents to his name, Tanaka has pushed the boundaries of innovation in scientific instrumentation, particularly in the accurate measurement of gas concentrations.

Latest Patents

Tanaka's latest patents include an "Absorbance Analysis Apparatus for DCR Gas" and an "Absorbance Analysis Method for DCR Gas," along with an "Absorbance Analysis Program Recording Medium on Which Program for DCR Gas is Recorded." These inventions are designed to measure the concentration of DCR gas by effectively isolating its absorbance even when present in a mixture with CO gas, whose absorption spectra overlap. The absorbance analysis apparatus utilizes a DCR filter to transmit light within a specified wavenumber domain, targeting the absorbance peak of DCR gas, in conjunction with a CO filter for the different wavenumber domain. Furthermore, the apparatus incorporates a DCR gas volume calculator that determines the volume of DCR gas by comparing absorbances measured through both filters.

Another inventive milestone includes a "Film Forming Apparatus" which facilitates the formation of films on substrates. This apparatus efficiently transfers source gas from a low-vapor-pressure source to a process container via a carrier gas and includes essential components such as gas pipes, valves, and measurement parts to ensure accurate flow rate measurements.

Career Highlights

Throughout his career, Masayuki Tanaka has made significant contributions while working with prestigious companies, including Tokyo Electron Limited and Horiba Stec, Co., Ltd. His experience in these organizations has deeply enriched his knowledge and skill set, enabling him to develop groundbreaking technologies.

Collaborations

Tanaka's journey in innovation has been enhanced through collaborations with talented individuals, including his coworkers Yuichi Furuya and Yuhei Sakaguchi. Working alongside talented teams has allowed him to refine his ideas and bring impactful inventions to fruition.

Conclusion

Masayuki Tanaka's unwavering commitment to innovation and excellence has positioned him as a respected figure in the realm of gas analysis and film formation technologies. His two patents reflect his capability to address complex challenges in the industry, paving the way for advancements that benefit various scientific applications. Tanaka’s work continues to inspire future innovations in the fields of technology and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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