Kyoto, Japan

Masayuki Orisaka

USPTO Granted Patents = 6 

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2025

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6 patents (USPTO):Explore Patents

Title: Masayuki Orisaka: Innovator in Substrate Processing Technology

Introduction

Masayuki Orisaka is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 6 patents. His innovative work focuses on enhancing the efficiency and quality of substrate processing methods.

Latest Patents

One of Orisaka's latest patents is a substrate processing apparatus that features a spin chuck designed to hold a substrate. This apparatus includes a fluid nozzle positioned to face the principal surface of the substrate. The fluid nozzle is equipped with a gas discharge port that discharges gas radially from the center to the peripheral edge of the substrate. Additionally, the gas flow passage has a tubular shape and includes a gas retaining portion with a larger cross-sectional area, which helps in rectifying the gas flow. Another notable patent involves a substrate processing method where processing liquid is split into multiple upflows, ensuring that bubbles are uniformly supplied to the substrate, thus enhancing the quality of substrate processing.

Career Highlights

Orisaka is currently associated with Screen Holdings Co., Ltd., where he continues to develop innovative solutions in substrate processing technology. His work has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

Some of his notable coworkers include Noritake Sumi and Masanobu Sato, who have collaborated with him on various projects within the company.

Conclusion

Masayuki Orisaka's contributions to substrate processing technology reflect his dedication to innovation and quality. His patents demonstrate a commitment to improving processing methods, making a significant impact in the industry.

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