The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2023
Filed:
Apr. 01, 2021
Screen Holdings Co., Ltd., Kyoto, JP;
Noritake Sumi, Kyoto, JP;
Masayuki Orisaka, Kyoto, JP;
Abstract
A processing fluid flows into a processing space SP by way of a flow passage and discharge openingshaving substantially the same cross-sectional shape as that of a gap space formed in a clearance between a wall surface of the processing space SP and a substrate holder. On the other hand, the processing fluid having passed through the processing space SP is discharged to an outside via discharge flow passagesafter flowing into the buffer spacehaving substantially the same width as the gap space. From these, the processing fluid can be caused to flow into the buffer spacewhile the laminar flow state is maintained in the gap space. Thus, the generation of a turbulence in the processing space SP can be suppressed.