Masayuki Nasu

Title: Masayuki Nasu: Innovator in Tungsten Film Technology

Introduction

Masayuki Nasu is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of film forming technology, particularly in the development of tungsten film forming methods. With a total of 4 patents to his name, Nasu continues to push the boundaries of innovation in his field.

Latest Patents

Nasu's latest patents include a tungsten film forming method and a film forming apparatus. The tungsten film forming method involves creating a tungsten film on a target substrate within a chamber maintained under a depressurized atmosphere. This method utilizes tungsten chloride gas as a raw material and a reducing gas to facilitate the process. The steps include an SiH gas treatment followed by the sequential supply of tungsten chloride gas and reducing gas while purging the chamber.

The film forming apparatus patent describes a system that includes gas supply paths, retaining units, valves, and a control unit. The control unit is designed to manage the film forming process by actuating valves to retain reaction gases and control internal pressures, ensuring efficient gas supply to the process chamber.

Career Highlights

Masayuki Nasu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of film formation processes.

Collaborations

Nasu collaborates with notable colleagues, including Masaki Sano and Yu Nunoshige, who contribute to his innovative projects and research endeavors.

Conclusion

Masayuki Nasu's contributions to tungsten film technology exemplify his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in film formation, positioning him as a key figure in the industry.