Masayuki Kimura

Title: Masayuki Kimura: Innovator in Photographic Materials

Introduction

Masayuki Kimura is a notable inventor based in Hino, Japan. He has made significant contributions to the field of photographic materials, particularly in the development of light-sensitive silver halide technologies. With a total of 2 patents, his work has had a lasting impact on the industry.

Latest Patents

Kimura's latest patents focus on enhancing the properties of light-sensitive silver halide photographic materials. One of his innovations involves improving the static resistance of these materials by treating them with a solution or dispersion of a polymer containing quaternary ammonium groups. This polymer not only enhances static resistance but also acts as an antifoaming agent in processing solutions. The polymeric moiety of the polymer is characterized by a specific formula, where R1, R2, R3, and R4 represent alkyl groups, and A and B denote various alkylene groups or other chemical structures. Another patent details a process for antistatic treatment of light-sensitive silver halide materials, utilizing polymerized pyridyl-type compounds as antistatic and antifoaming agents.

Career Highlights

Throughout his career, Kimura has worked with prominent companies in the photographic industry, including Konishiroku Photo Industry Co., Ltd. and Hokuetsu Paper Mills, Ltd. His expertise in photographic materials has positioned him as a key figure in the development of innovative solutions for the industry.

Collaborations

Kimura has collaborated with notable colleagues such as Toshio Muramatsu and Sadatugu Terada. These partnerships have contributed to the advancement of technology in photographic materials.

Conclusion

Masayuki Kimura's contributions to the field of photographic materials through his patents and collaborations highlight his role as an innovator. His work continues to influence the industry, showcasing the importance of advancements in photographic technology.