Konishiroku Photo Industry Co., Ltd.

Hokuetsu Paper Mills, Ltd.

Masayuki Kimura

Sadatugu Terada

Masayoshi Mayama

Toshio Muramatsu

Koichi Nagayasu

Tohru Kobayashi

Masao Ishibara

Static resistance of a light-sensitive silver halide photographic material is improved by treating said material with a solution or dispersion of a polymer containing quaternary ammonium groups, and which also acts as an antifoaming agent in processing solutions. The polymeric moiety of the polymer has the formula ##STR1## WHEREIN R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are individually a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms; A and B are individually an alkylene group having 1 to 4 carbon atoms, a hydroxymethylene group, a phenylene group or a mere bond; X.sub.1.sup..crclbar. and X.sub.2.sup..crclbar. are individually an anion; and n is an integer of 10 to 30.

Light-sensitive silver halide photographic materials containing

Antistatic and antifoaming agents for use with light sensitive silver halide photographic materials comprised of polymerized pyridyl-type compounds are disclosed.

Process for antistatic treatment of light-sensitive silver halide

Growing community of inventors

Hino, Japan

Masayuki Kimura