The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 1978
Filed:
Mar. 18, 1977
Masayoshi Mayama, Hachioji, JP;
Sadatugu Terada, Hachioji, JP;
Toshio Muramatsu, Hachioji, JP;
Masayuki Kimura, Hino, JP;
Masao Ishibara, Hino, JP;
Tohru Kobayashi, Hino, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Hokuetsu Paper Mills Ltd., Tokyo, JP;
Abstract
Static resistance of a light-sensitive silver halide photographic material is improved by treating said material with a solution or dispersion of a polymer containing quaternary ammonium groups, and which also acts as an antifoaming agent in processing solutions. The polymeric moiety of the polymer has the formula ##STR1## WHEREIN R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are individually a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms; A and B are individually an alkylene group having 1 to 4 carbon atoms, a hydroxymethylene group, a phenylene group or a mere bond; X.sub.1.sup..crclbar. and X.sub.2.sup..crclbar. are individually an anion; and n is an integer of 10 to 30.