Kanagawa, Japan

Masayuki Hatano

This inventor holds 4 USPTO granted patents and 4 published patent applications. Top assignee: Kioxia Corporation. Active years: 2023-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Hatano. Retrieved from https://idiyas.com/inventor/masayuki-hatano-l4kt8whd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 1


Location History:

  • Kanagawa, JP (2023 - 2024)
  • Yokkaichi Mie, JP (2024)

Company Filing History:


Years Active: 2023-2025

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Masayuki Hatano

Introduction

Masayuki Hatano is a notable inventor based in Kanagawa, Japan. He has made significant strides in the field of semiconductor technology, holding a total of four patents. His latest contributions are particularly relevant in the manufacturing methods of templates and semiconductor devices.

Latest Patents

Hatano's recent patents showcase his innovative approach to semiconductor manufacturing. One of his notable inventions is the design of an imprint template, which includes a substrate featuring a first surface and a mesa part that protrudes from it. This mesa part has a second surface adorned with a specific pattern and includes a sloped region that facilitates optimal functioning during the manufacturing process.

In another embodiment, Hatano has developed a comprehensive imprint method for substrates with multiple shot regions. This method provides a dual processing approach, where a template presses against a target shot region while taking careful measures to avoid contact with non-target regions. The use of inert gas during these processes enhances the efficiency and accuracy of the semiconductor production.

Career Highlights

Masayuki Hatano is currently affiliated with Kioxia Corporation, a leader in the memory and storage industry. His work in semiconductor device manufacturing has contributed to advancements in this critical sector, demonstrating his commitment to innovation in technology.

Collaborations

Throughout his career, Hatano has collaborated with esteemed colleagues, including Tetsuro Nakasugi and Kazuya Fukuhara. Their joint efforts have further enriched the field of semiconductor technology, fostering an environment of teamwork and innovation.

Conclusion

Masayuki Hatano’s impact in the field of semiconductor manufacturing is marked by his patented inventions and collaborative spirit. As he continues to develop groundbreaking methods, he stands as a prominent figure in shaping the future of technology within Kioxia Corporation and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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