The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2024
Filed:
Aug. 26, 2022
Kioxia Corporation, Tokyo, JP;
Hirokazu Miyoshi, Yokkaichi Mie, JP;
Masayuki Hatano, Yokkaichi Mie, JP;
Kioxia Corporation, Tokyo, JP;
Abstract
According to one embodiment, an imprint method for a substrate having a plurality of shot regions includes performing a first process on each target shot region in the plurality of shot regions and performing a second process on a non-target shot region in the plurality of shot regions. The first process includes pressing a template against resin in the target shot region to transfer a pattern to the resin, curing the resin, and releasing the template from the cured resin while supplying inert gas towards the substrate from an outer edge side of the template. The second process includes causing the template to approach the non-target shot region without coming into contact with resin in the non-target shot region, and moving the template away from the resin in the non-target shot region while supplying inert gas towards the substrate from the outer edge side of the template.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile