This inventor holds 1 USPTO granted patent. Top assignee: Kioxia Corporation. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Hirokazu Miyoshi: Semiconductor Imprint Technology
Introduction
Hirokazu Miyoshi is an inventor associated with Kioxia Corporation in Yokkaichi, Japan. His work includes an invention for imprinting patterns on semiconductor substrates.
Latest Patents
Miyoshi is named on 1 patent: “Imprint Method, Method of Manufacturing Semiconductor Device, and Imprint Device.” The patent describes a process for transferring a pattern onto resin in selected substrate regions by pressing a template against the resin, curing it, and releasing the template while supplying inert gas from the template’s outer edge toward the substrate. For regions not being patterned, the template approaches without touching the resin and then moves away, with inert gas supplied during the movement.
Career Highlights
Miyoshi’s listed patent work concerns semiconductor manufacturing and imprint technology. The disclosed method addresses both pattern transfer in target regions and template movement over non-target regions.
Collaborations
Miyoshi is associated with Kioxia Corporation. His listed coworker is Masayuki Hatano.
Conclusion
Hirokazu Miyoshi’s patent describes an imprinting approach that combines controlled template movement and inert-gas supply in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile