Location History:
- Chiba-ken, JP (1998)
- Narita, JP (2003)
Company Filing History:
Years Active: 1998-2003
Title: Masayuki Hashimoto: Innovator in Semiconductor Technology
Introduction
Masayuki Hashimoto is a prominent inventor based in Narita, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods and systems for film formation, which are crucial in the production of semiconductor devices.
Latest Patents
Hashimoto's latest patents include a "Method and system for forming film" and a "semiconductor device and fabrication method thereof." The objective of his invention is to provide a film-forming method and system that achieves adequate thickness repeatability and uniformity, along with sufficiently large film-forming rates. This innovation simplifies the system configuration for forming thin films on substrates. His thermal treatment system is designed for forming a thin film of SiO on an Si wafer, incorporating a reactant gas exhaust system and a reactant gas supply system to enhance the film formation process.
Career Highlights
Masayuki Hashimoto is currently associated with Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in film formation technology has positioned him as a key player in advancing semiconductor manufacturing processes.
Collaborations
Throughout his career, Hashimoto has collaborated with notable colleagues, including Kunio Kurihara and Nobuo Tokai. These collaborations have further enriched his contributions to the field of semiconductor technology.
Conclusion
Masayuki Hashimoto's innovative work in semiconductor technology, particularly in film formation methods, has made a significant impact on the industry. His patents reflect his commitment to advancing technology and improving manufacturing processes.