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For the Inventor, By the Inventor

Tokyo, Japan

Masaya Ogura

This inventor holds 13 USPTO granted patents and 1 EPO patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2002-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaya Ogura. Retrieved from https://idiyas.com/inventor/masaya-ogura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 30.8

 

Average Co-Inventor Count = 2.5

ph-index = 7

Forward Citations = 175(Granted Patents)


Location History:

  • Utsunomiya, JP (2002 - 2017)
  • Tokyo, JP (2004 - 2017)

Company Filing History:

goldMedal13 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2002-2017

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13 patents (USPTO):Explore Patents
1. 9644998 - Testing element, testing apparatus, and testing system (2017-05-09),
2. 9592509 - Flow passage device and method of transporting liquid using the same (2017-03-14),
3. 9162433 - Method of producing flow passage device and flow passage device (2015-10-20),
4. 8080381 - Infectious etiologic agent detection probe and probe set, carrier, and genetic screening method (2011-12-20),
5. 7805279 - Remote maintenance system (2010-09-28),
6. 7225041 - Information providing method and system (2007-05-29),
7. 7062343 - Remote maintenance system (2006-06-13),
8. 6980872 - Information providing method and system (2005-12-27),
9. 6963786 - Remote maintenance system (2005-11-08),
10. 6957112 - Industrial machine management system and method (2005-10-18),
11. 6892109 - Remote maintenance system (2005-05-10),
12. 6795161 - Exposure apparatus, method of manufacturing semiconductor devices and plant therefor (2004-09-21),
13. 6385497 - Remote maintenance system (2002-05-07),

Title: Masaya Ogura: Innovator in Testing Technologies

Introduction

Masaya Ogura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of testing technologies, holding a total of 13 patents. His work focuses on improving the efficiency and effectiveness of laboratory tests and fluid transportation systems.

Latest Patents

One of Ogura's latest inventions is a testing element, testing apparatus, and testing system designed to enhance laboratory testing efficiency. Conventional laboratory tests often require calibration before each test, which can be time-consuming and necessitates the use of reagents. Ogura's invention addresses this issue by providing a testing element that includes an information recording section. This section is located on the surface and/or inside the testing element and stores information about its characteristics, thereby streamlining the testing process.

Another notable patent is a flow passage device and method for transporting liquid. This device allows for the easy introduction of liquids while minimizing the introduction of air bubbles into the flow passage. The design includes a flow passage that directs fluid flow in a non-vertical direction, an introducing space with a supply port that opens vertically, and a buffering space that connects the flow passage to the introducing space. This innovative design helps to form a gas-liquid interface due to surface tension, improving the overall efficiency of liquid transportation.

Career Highlights

Masaya Ogura is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to develop and patent several innovative solutions that address common challenges in laboratory testing and fluid dynamics.

Collaborations

Ogura has collaborated with notable colleagues, including Nobuaki Ogushi and Hirohisa Ohta. Their combined expertise has contributed to the advancement of technologies in their respective fields.

Conclusion

Masaya Ogura's contributions to testing technologies exemplify the impact of innovation in improving laboratory efficiency and fluid transportation. His patents reflect a commitment to solving real-world problems through inventive solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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