Canon Kabushiki Kaisha

Masaya Ogura

Nobuaki Ogushi

Yoshito Yoneyama

Hirohisa Ohta

Hideki Ina

Ichiro Kano

Shinji Utamura

Kaoru Mizushiri

Masahiro Ohtake

Takashi Sugimori

Tomohiro Suzuki

Hiroto Yoshii

Toshifumi Fukui

Nobuko Yamamoto

Mie Ishii

Masahiro Kawaguchi

Eiichi Murakami

Mamoru Tsukada

Conventional laboratory tests require calibration before each test. This results in the need for a reagent for calibration before each test. Additionally, calibration takes a long time, and the total TAT (Turn Around Time) of a testing system increases. The testing system thus suffers from the difficulty of improving the testing efficiency. This invention, which has been made to solve the problem, provides a testing element for performing a laboratory test, wherein the testing element includes an information recording section at the surface of and/or inside the testing element, and the information recording section stores information on a characteristic of the testing element.

Testing element, testing apparatus, and testing system

A flow passage device is provided, with which a liquid is easily introduced and introduction of air bubbles into a flow passage along with a liquid when the liquid is introduced into the flow passage can be decreased. A flow passage device according to the present invention includes a flow passage through which a fluid flows in a direction different from a vertical direction, an introducing space that has a supply port opening toward the vertical direction and introduces a liquid into the flow passage, and a buffering space that connects the flow passage to the introducing space. The buffering space allows a gas-liquid interface to be formed due to surface tension. A direction in which the gas-liquid interface faces is different from the vertical direction.

Flow passage device and method of transporting liquid using the same

A flow passage device includes a first base body having a first hole and a second base body having a second hole connected to the first hole to form a flow passage. A first portion formed around the first hole has a specified shape for holding an adhesive. The second base body has a high-wettability surface around the second hole with a low-wettability surface disposed proximate the high-wettability surface, and at least part of the high-wettability surface has a shape matching at least part of the specified shape. The first and second base body are bonded to each other with the adhesive to form the flow passage by aligning the at least part of the first portion with the at least part of the high-wettability surface with positions of the first and the second holes aligned with each other.

Method of producing flow passage device and flow passage device

An infectious etiologic agent detection probe set which detects an infectious etiologic agent gene, includes a plurality of kinds of probes including oligonucleotide having base sequences selected from each of a plurality of groups selected from a first group including base sequences of SEQ ID Nos. 1 to 14 and complementary sequences thereof, a second group including base sequences of SEQ ID Nos. 15 to 24 and complementary sequences thereof, a third group including base sequences of SEQ ID Nos. 25 to 36 and complementary sequences thereof, a fourth group including base sequences of SEQ ID Nos. 37 to 47 and complementary sequences thereof, a fifth group including base sequences of SEQ ID Nos. 48 to 57 and complementary sequences thereof, a sixth group including base sequences of SEQ ID Nos. 58 to 68 and complementary sequences thereof, a seventh group including base sequences of SEQ ID Nos. 69 to 77 and complementary sequences thereof, an eighth group including base sequences of SEQ ID Nos. 78 to 85 and complementary sequences thereof, a ninth group including base sequences of SEQ ID Nos. 86 to 97 and complementary sequences thereof, and a 10th group including base sequences of SEQ ID Nos. 98 to 106 and complementary sequences thereof.

Infectious etiologic agent detection probe and probe set, carrier, and genetic screening method

Factories (-) have host computers () for monitoring industrial equipment (). Each host computer () is connected to a management host computer () on a vendor () side through the internet (). The host computer () on the factory side detects occurrence of a trouble of the industrial equipment () and notifies the vendor side of status information representing a trouble state. In response to this, the host computer () on the vendor side notifies the factory side of response information representing a countermeasure against the trouble state.

Remote maintenance system

An information providing system includes a reception unit that receives first information concerning a process to be performed by an apparatus from a customer via a network, a processing unit which simulates the process based on the first information and prepares second information based on a result of the simulation, and a transmission unit which transmits the second information to the customer via a network.

Information providing method and system

Factories () have host computers () for monitoring industrial equipment (). Each host computer () is connected to a management host computer () on a vendor () side through the internet (). The host computer () on the factory side detects occurrence of a trouble of the industrial equipment () and notifies the vendor side of status information representing a trouble state. In response to this, the host computer () on the vendor side notifies the factory side of response information representing a countermeasure against the trouble state.

An information providing system which includes a reception unit that receives first information concerning a process to be performed by an apparatus from a customer via a network, a processing unit which simulates the process based on the first information and prepares second information based on a result of the simulation, and a transmission unit which transmits the second information to the customer via a network.

Factories () have host computers () for monitoring industrial equipments (). Each host computer () is connected to a management host computer () on a vendor () side through the internet (). The host computer () on the factory side detects occurrence of a trouble of the industrial equipment () and notifies the vendor side of status information representing a trouble state. In response to this, the host computer () on the vendor side notifies the factory side of response information representing a countermeasure against the trouble state.

A system for quickly and easily optimizing the parameters of an industrial machine or solving any trouble in industrial machine is provided. A factory () and vendor () are connected through a data communication network (). A management apparatus () selectively gives the operation right of an industrial machine () to a factory-side operation apparatus () or a vendor-side operation apparatus () arranged at a remote site. The operation apparatus having the given operation right can operate the industrial machine () and obtain information representing the operation condition of the industrial machine.

Industrial machine management system and method

An exposure apparatus having an illuminating optics unit for irradiating a reticle, on which a predetermined pattern has been formed, with exposing light emitted from an exposure light source, a reticle stage on which the reticle is placed, a projection optics unit for projecting the predetermined pattern of the reticle onto a substrate, and a substrate stage on which the substrate is placed. The apparatus includes at least one chamber for internally accommodating the illuminating optics unit, the reticle stage, the projection optics unit and the substrate stage, a first pressure control device for making a value of pressure inside the at least one chamber higher than a value of pressure outside the at least one chamber, and a first correction device for correcting optical characteristics of the projection optics unit, by performing at least one of (i) moving an adjustment unit for adjusting the optical characteristics of the projection optics unit and (ii) shifting a wavelength of the exposing light, in accordance with the value of the pressure inside the at least one chamber.

Exposure apparatus, method of manufacturing semiconductor devices and plant therefor

Factories ( ) have host computers ( ) for monitoring industrial equipments ( ). Each host computer ( ) is connected to a management host computer ( ) on a vendor ( ) side through the internet ( ). The host computer ( ) on the factory side detects occurrence of a trouble of the industrial equipment ( ) and notifies the vendor side of status information representing a trouble state. In response to this, the host computer ( ) on the vendor side notifies the factory side of response information representing a countermeasure against the trouble state.

Growing community of inventors

Tokyo, Japan

Masaya Ogura