Location History:
- Kadoma, JP (1989)
- Nara, JP (2004)
Company Filing History:
Years Active: 1989-2004
Title: Masaya Manno: Innovator in Semiconductor Technology
Introduction
Masaya Manno is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advancing the capabilities and efficiency of semiconductor lasers and manufacturing methods.
Latest Patents
Manno's latest patents include a semiconductor laser and a manufacturing method for the same. The semiconductor laser features an n-type cladding layer with n-type conductivity, an active layer positioned atop the n-type cladding layer, and a p-type cladding base layer that has p-type conductivity. Additionally, it incorporates a current-blocking layer with varying concentrations of n-type carriers, enhancing its performance. His method of laser enhanced vapor phase growth for compound semiconductors involves introducing source gases into an epitaxial growth reactor while manipulating light irradiation to alter the composition and carrier concentration of the growth film.
Career Highlights
Masaya Manno is associated with Matsushita Electric Industrial Co., Ltd., where he has been instrumental in developing innovative semiconductor technologies. His expertise has contributed to the advancement of the company's product offerings in the semiconductor sector.
Collaborations
Manno has collaborated with notable colleagues, including Yuzaburo Ban and Minoru Kubo. Their combined efforts have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Masaya Manno's contributions to semiconductor technology exemplify his dedication to innovation. His patents and collaborative efforts continue to influence the field, paving the way for future advancements in semiconductor applications.