Kamakura, Japan

Masaya Komatsu

USPTO Granted Patents = 1 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Sure, here is the article about inventor Masaya Komatsu:

Title: Inventor Spotlight: Masaya Komatsu

Introduction:

Masaya Komatsu, a talented inventor based in Kamakura, Japan, has made significant contributions to the field of lithographic processes with his innovative patent.

Latest Patents:

Masaya Komatsu holds one patent for "Sub-field control of a lithographic process and associated apparatus." This patent details a method for controlling a lithographic apparatus to pattern an exposure field on a substrate, involving the decomposition of an initial spatial profile into two component spatial profiles for precise control.

Career Highlights:

Currently affiliated with ASML Netherlands B.V., Masaya Komatsu has shown expertise in optimizing lithographic processes. His attention to detail and problem-solving skills have led to the development of groundbreaking techniques in the industry.

Collaborations:

Masaya Komatsu has collaborated with esteemed coworkers such as Rowin Meijerink and Putra Saputra. Together, they have worked on refining lithographic processes and pushing the boundaries of technological advancements in the field.

Conclusion:

Inventor Masaya Komatsu's dedication to innovation and his pioneering work in lithographic processes have undoubtedly left a lasting impact on the industry. His patent serves as a testament to his ingenuity and commitment to advancing technology in the field of lithography.

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