The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2023
Filed:
Mar. 05, 2020
Asml Netherlands B.v., Veldhoven, NL;
Rowin Meijerink, Valkenswaard, NL;
Putra Saputra, Singapore, SG;
Pieter Gerardus Jacobus Smorenberg, Rotterdam, NL;
Theo Wilhelmus Maria Thijssen, Eindhoven, NL;
Khalid Elbattay, Eindhoven, NL;
Ma Su Su Hlaing, Eindhoven, NL;
Paul Derwin, Eindhoven, NL;
Bo Zhong, Mie, JP;
Masaya Komatsu, Kamakura, JP;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.