This inventor holds 1 USPTO granted patent. Top assignee: Jsr Corporation. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Masatoshi Ikeda and Chemical Mechanical Polishing Innovation.
Introduction
Masatoshi Ikeda is an inventor associated with Yokkaichi, Japan, and JSR Corporation. His patent work concerns aqueous dispersions used in chemical mechanical polishing, a process for polishing material surfaces.
Latest Patents
The provided information identifies one patent associated with Ikeda: “Aqueous Dispersion for Chemical Mechanical Polishing and Chemical Mechanical Polishing Method.” The invention describes an aqueous dispersion containing silica particles and an organic acid. It specifies sodium content of 5 to 500 ppm in the silica particles and requires either potassium content or ammonium ion content to be between 100 and 20,000 ppm, as determined using specified analytical methods. The record lists 1 patent for Ikeda.
Career Highlights
Ikeda’s listed patent reflects work on the composition and measurement of silica-based polishing dispersions. The invention also describes a chemical mechanical polishing method using the dispersion.
Collaborations
The provided information names Takafumi Shimizu and Yousuke Shibata as Ikeda’s coworkers. It does not specify their roles in the patent or the extent of their collaboration.
Conclusion
Masatoshi Ikeda’s listed invention focuses on controlling the composition of an aqueous silica dispersion for chemical mechanical polishing, connecting his patent record with materials and polishing technology at JSR Corporation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile