The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2013

Filed:

Jan. 16, 2009
Applicants:

Hirotaka Shida, Yokkaichi, JP;

Takafumi Shimizu, Yokkaichi, JP;

Masatoshi Ikeda, Yokkaichi, JP;

Shou Kubouchi, Yokkaichi, JP;

Yousuke Shibata, Yokkaichi, JP;

Kazuhito Uchikura, Yokkaichi, JP;

Akihiro Takemura, Yokkaichi, JP;

Inventors:

Hirotaka Shida, Yokkaichi, JP;

Takafumi Shimizu, Yokkaichi, JP;

Masatoshi Ikeda, Yokkaichi, JP;

Shou Kubouchi, Yokkaichi, JP;

Yousuke Shibata, Yokkaichi, JP;

Kazuhito Uchikura, Yokkaichi, JP;

Akihiro Takemura, Yokkaichi, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemical mechanical polishing aqueous dispersion including (A) silica particles, and (B1) an organic acid, the sodium content, the potassium content, and the ammonium ion content of the silica particles (A) determined by ICP atomic emission spectrometry, ICP mass spectrometry, or ammonium ion quantitative analysis using ion chromatography having a relationship in which the sodium content is 5 to 500 ppm and at least one of the potassium content and the ammonium ion content is 100 to 20,000 ppm.


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