Santa Clara, CA, United States of America

Masato Tamura

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Hitachi, Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Tamura. Retrieved from https://idiyas.com/inventor/masato-tamura-gn3oojer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Masato Tamura: Innovator in Surveillance Technology

Introduction

Masato Tamura is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of surveillance technology. His innovative approach focuses on tracking and monitoring subjects and objects effectively.

Latest Patents

Masato Tamura holds a patent for a surveillance system and surveillance device. This patent describes a method for tracking and monitoring subjects and a plurality of objects. The method includes obtaining an image that contains the subjects and objects, extracting them through feature extraction, detecting interactions between them, and tracking subject-object pairs with detected interactions. This invention showcases his expertise in enhancing surveillance capabilities.

Career Highlights

Masato Tamura is associated with Hitachi, Ltd., where he applies his skills in developing advanced surveillance technologies. His work has contributed to the company's reputation for innovation in the tech industry.

Collaborations

Masato collaborates with Ravigopal Vennelakanti, working together to push the boundaries of surveillance technology and improve the effectiveness of their inventions.

Conclusion

Masato Tamura's contributions to surveillance technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence how we monitor and track subjects and objects in various environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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