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For the Inventor, By the Inventor

Machida, Japan

Masato Saito

This inventor holds 7 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2006-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Saito. Retrieved from https://idiyas.com/inventor/masato-saito-mzgts2dg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7

% Patents Active = 42.9

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal7 out of 53,286 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 2006-2018

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7 patents (USPTO):Explore Patents
1. 9957630 - Pattern transfer mold and pattern formation method (2018-05-01),
2. 8962081 - Template forming method (2015-02-24),
3. 8057966 - Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask (2011-11-15),
4. 7608368 - Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product (2009-10-27),
5. 7564049 - Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method (2009-07-21),
6. 7477406 - Photomask evaluation method and manufacturing method of semiconductor device (2009-01-13),
7. 7119348 - Charged beam writing apparatus and writing method (2006-10-10),

Title: Masato Saito: Innovator in Pattern Transfer Technology

Introduction

Masato Saito is a prominent inventor based in Machida, Japan. He has made significant contributions to the field of pattern transfer technology, holding a total of 7 patents. His work focuses on innovative methods and devices that enhance the efficiency and precision of pattern formation.

Latest Patents

Among his latest patents, Saito has developed a pattern transfer mold and a pattern formation method. The pattern transfer mold includes a base body with a first surface, first and second protrusions, and stacked bodies that contain conductive and insulating layers. This design allows for effective electrical connections through electrodes linked to the conductive layers. Additionally, his template forming method involves transferring a pattern from a first template to a substrate, utilizing an imprinting method to create a second template. This process includes forming resist films and processing the substrate to achieve the desired pattern.

Career Highlights

Masato Saito is associated with Kabushiki Kaisha Toshiba, where he has been instrumental in advancing technologies related to pattern transfer. His innovative approaches have positioned him as a key figure in his field, contributing to the company's reputation for excellence in technology development.

Collaborations

Saito has collaborated with notable colleagues, including Yongfang Li and Ryoichi Inanami. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the innovation process.

Conclusion

Masato Saito's contributions to pattern transfer technology exemplify the spirit of innovation. His patents and collaborative efforts continue to influence advancements in the field, showcasing his dedication to improving technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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