Company Filing History:
Years Active: 2006-2018
Title: Masato Saito: Innovator in Pattern Transfer Technology
Introduction
Masato Saito is a prominent inventor based in Machida, Japan. He has made significant contributions to the field of pattern transfer technology, holding a total of 7 patents. His work focuses on innovative methods and devices that enhance the efficiency and precision of pattern formation.
Latest Patents
Among his latest patents, Saito has developed a pattern transfer mold and a pattern formation method. The pattern transfer mold includes a base body with a first surface, first and second protrusions, and stacked bodies that contain conductive and insulating layers. This design allows for effective electrical connections through electrodes linked to the conductive layers. Additionally, his template forming method involves transferring a pattern from a first template to a substrate, utilizing an imprinting method to create a second template. This process includes forming resist films and processing the substrate to achieve the desired pattern.
Career Highlights
Masato Saito is associated with Kabushiki Kaisha Toshiba, where he has been instrumental in advancing technologies related to pattern transfer. His innovative approaches have positioned him as a key figure in his field, contributing to the company's reputation for excellence in technology development.
Collaborations
Saito has collaborated with notable colleagues, including Yongfang Li and Ryoichi Inanami. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the innovation process.
Conclusion
Masato Saito's contributions to pattern transfer technology exemplify the spirit of innovation. His patents and collaborative efforts continue to influence advancements in the field, showcasing his dedication to improving technology.