The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Jun. 24, 2009
Masato Saito, Machida, JP;
Masato Saito, Machida, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A position deviation and an image of a danger control pattern predicted after multiple exposure of each mask used for multiple exposure are acquired and an image after lap exposure by means of the masks based on the above image and position deviation information. At this time, parameters such as an offset amount caused by overlapping of images of the masks, rotation amount and the like are changed and a parameter capable of avoiding occurrence of faults in a dangerous pattern in an image predicted after lap exposure is calculated.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile